b) Conductometric gas sensors Sensors whose electrical conductivity changes in the presence of target gases (e.g., metal oxide gas sensors).
c) Micromachining technologies Bulk micromachining, Surface micromachining, LIGA, DRIE.
d) Electrostatic (definition) Concerned with forces and fields due to electric charges at rest; widely used for MEMS actuation.
e) Scaling effects in Microsystems (brief) As size reduces, surface forces dominate over volume forces, affecting stiffness, electrostatics, heat transfer.
f) Micro and nanofabrication Processes used to fabricate structures in the micrometer and nanometer scale using lithography, deposition, etching.
g) Types of microsensors Mechanical, Thermal, Chemical, Optical, Magnetic, Biosensors.
h) Lithography (brief) Pattern transfer process using light/beam exposure to define microstructures on substrates.
i) Pull-in voltage Minimum voltage at which an electrostatically actuated MEMS structure collapses onto the electrode.
j) Diffusion Movement of dopant atoms in a semiconductor due to concentration gradient and temperature.
SECTION B (10 × 3 = 30 Marks)
Attempt any three
a) Smart materials & Integrated Microsystems
Smart materials: Respond to external stimuli (piezoelectric, shape memory alloys). Integrated Microsystems: Combine sensors, actuators, electronics, and control on a single platform.
b) Silicon capacitive accelerometer & piezoresistive pressure sensor
Capacitive accelerometer: Measures acceleration via change in capacitance between fixed and movable electrodes.
Piezoresistive pressure sensor: Uses resistance change in silicon strain gauges due to applied pressure.
c) Thin film deposition & Etching
Deposition: CVD, PVD for forming thin layers.
Etching: Wet and dry etching to remove material selectively.
d) Anticlastic curvature & torsion of beams
Anticlastic curvature: Opposite curvature induced in perpendicular direction during bending.
Torsion: Twisting of beams due to applied torque.
e) Integrated Microsystems & Packaging
Integrated Microsystems combine multiple functions on one chip. Packaging steps: Die attach → Wire bonding → Encapsulation → Testing → Integration.
SECTION C (10 × 5 = 50 Marks)
Attempt one from each question
Q3(a) Miniaturization process & need
Process: Scaling down components using microfabrication techniques. Need: Reduced size & power
Higher performance Lower cost
System integration
Q3(b) Microsystems vs MEMS
Aspect
Microsystems
MEMS
Scope
Broad
Subset
Components
Sensors, actuators, control
Mainly micro-mechanical
Integration
High
Moderate
Q4(a) Portable blood analyzer & piezoelectric inkjet print head
Blood analyzer: Microfluidic system for rapid diagnostics.
Silicon micromachining: Bulk and surface techniques to shape silicon. Materials: Polysilicon, Silicon nitride, Piezoelectric materials, Polymers.
Q5(b) Advanced microfabrication processes
Deep Reactive Ion Etching (DRIE)
LIGA
Nanoimprint lithography
Atomic Layer Deposition (ALD)
Q6(a) Short notes
Bimorph effect: Bending due to different thermal expansion in layered materials.
Residual stress: Stress locked in films after fabrication.
Poisson’s effect: Lateral strain due to axial stress.
Q6(b) Coupled electro-mechanics & squeezed film effects
Coupled electro-mechanics studies interaction of electrical and mechanical domains. Squeezed film effect: Damping caused by trapped air between moving MEMS structures.
Q7(a) Scaling effects in electrostatic & magnetic domains
Electrostatic forces: Scale favorably with miniaturization.
Magnetic forces: Weaken significantly at microscale.
Q7(b) Smart-structure vibration control (case study)
Smart structures use sensors + actuators + control algorithms (e.g., piezoelectric patches) to actively suppress vibrations in aerospace and civil structures.
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